MICRO/NANO FABRICATION
 
 
 
         
 
 
¹øÈ£ »çÁø Àåºñ¸í ºÐ·ù Àåºñº¸±â ¿¹¾à½Åû
32 E-SEM INSPECTION
31 Electroforming Machine DEPOSITION
30 PECVD II DEPOSITION
29 LPCVD3 (LTO) DEPOSITION
28 LPCVD4 (Low Stress Nitride) DEPOSITION
27 RIE II ETCHING
26 񃧯Charge OTHERS
25 FURNACE 2 DEPOSITION
24 LPCVD5(Poly) DEPOSITION
23 Multi Sputter DEPOSITION
22 °ø°£»ç¿ë·á OTHERS
21 E-beam Lithography PHOTO_LITHOGRAPHY
20 wafer Á¦°ø OTHERS
19 Ion Milling ETCHING
18 »ç¹°ÇÔ OTHERS
17 E-Beam Evaporator II DEPOSITION
16 RIE¥² ETCHING
15 Spin Coater3 PHOTO_LITHOGRAPHY
14 ½Ã¾à¾ÈÀüº¸°üÇÔ OTHERS
13 À¯±â½Ã¾àº¸°üÇÔ OTHERS
   
 
    [1][2][3]